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  High Reflectance Nanoscale V/Sc Multilayer for Soft X-ray Water Window Region

Huang, Q., Yi, Q., Cao, Z., Qi, R., Loch, R., Jonnard, P., et al. (2017). High Reflectance Nanoscale V/Sc Multilayer for Soft X-ray Water Window Region. Scientific Reports, 7: 12929. doi:10.1038/s41598-017-13222-5.

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Item Permalink: http://hdl.handle.net/21.11116/0000-0001-9A1E-1 Version Permalink: http://hdl.handle.net/21.11116/0000-0001-A5FB-A
Genre: Journal Article

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s41598-017-13222-5.pdf (Publisher version), 3MB
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https://dx.doi.org/10.1038/s41598-017-13222-5 (Publisher version)
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 Creators:
Huang, Q.1, Author
Yi, Q.2, Author
Cao, Z.3, Author
Qi, R.1, Author
Loch, R.4, Author              
Jonnard, P.5, 6, Author
Wu, M.5, 6, Author
Giglia, A.7, Author
Li, W.1, Author
Louis, E.8, Author
Bijkerk, F.8, Author
Zhang, Z.1, Author
Wang, Z.1, Author
Affiliations:
1Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, ou_persistent22              
2Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang, ou_persistent22              
3Shanghai Institute of Laser Plasma, China Academy of Engineering Physics, Shanghai, ou_persistent22              
4Miller Group, Atomically Resolved Dynamics Department, Max Planck Institute for the Structure and Dynamics of Matter, Max Planck Society, ou_1938288              
5Sorbonne Universités, UPMC Univ Paris 06, Laboratoire de Chimie Physique-Matière et Rayonnement, ou_persistent22              
6CNRS UMR 7614, Laboratoire de Chimie Physique-Matière et Rayonnement, ou_persistent22              
7CNR Istituto Officina Materiali, ou_persistent22              
8Industrial Focus Group XUV Optics, MESA + Institute for Nanotechnology, University of Twente, ou_persistent22              

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 Abstract: V/Sc multilayer is experimentally demonstrated for the first time as a high reflectance mirror for the soft X-ray water window region. It primarily works at above the Sc-L edge (λ = 3.11 nm) under near normal incidence while a second peak appears at above the V-L edge (λ = 2.42 nm) under grazing incidence. The V/Sc multilayer fabricated with a d-spacing of 1.59 nm and 30 bilayers has a smaller interface width (σ = 0.27 and 0.32 nm) than the conventional used Cr/Sc (σ = 0.28 and 0.47 nm). For V/Sc multilayer with 30 bilayers, the introduction of B4C barrier layers has little improvement on the interface structure. As the number of bilayers increasing to 400, the growth morphology and microstructure of the V/Sc layers evolves with slightly increased crystallization. Nevertheless, the surface roughness remains to be 0.25 nm. A maximum soft X-ray reflectance of 18.4% is measured at λ = 3.129 nm at 9° off-normal incidence using the 400-bilayers V/Sc multilayer. According to the fitted model, an s-polarization reflectance of 5.2% can also be expected at λ = 2.425 nm under 40° incidence. Based on the promising experimental results, further improvement of the reflectance can be achieved by using a more stable deposition system, exploring different interface engineering methods and so on.

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Language(s): eng - English
 Dates: 2017-02-232017-09-202017-10-10
 Publication Status: Published online
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: Peer
 Identifiers: DOI: 10.1038/s41598-017-13222-5
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Project name : This work is supported by National Key Research and Development Program of China (No. 2016YFA0401304), National Natural Science Foundation of China (No. 11505129, No. 11375130); National Key Scientific Instrument and Equipment Development Project (No. 2012YQ13012505, 2012YQ24026402); Shanghai Pujiang Program (No. 15PJ1408000). The SXR reflectivity measurements were carried out at the ELETTRA synchrotron in the framework of Proposal No. 20150417.
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Title: Scientific Reports
  Abbreviation : Sci. Rep.
Source Genre: Journal
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Publ. Info: London, UK : Nature Publishing Group
Pages: - Volume / Issue: 7 Sequence Number: 12929 Start / End Page: - Identifier: ISSN: 2045-2322
CoNE: /journals/resource/2045-2322