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  Fabrication of thermosensitive polymer nanopatterns through chemical lithography and atom transfer radical polymerization

He, Q., Küller, A., Grunze, M., & Li, J. (2007). Fabrication of thermosensitive polymer nanopatterns through chemical lithography and atom transfer radical polymerization. Langmuir, 23(7), 3981-3987. doi:10.1021/la062793u.

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 Creators:
He, Qiang, Author
Küller, Alexander, Author
Grunze, Michael1, Author           
Li, Junbai, Author
Affiliations:
1Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society, ou_2364731              

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 Abstract: Micro- and nanopatterns of thermosensitive poly(N-isopropylacrylamide) brush on gold substrate were prepared by using chemical lithography combined with surface-initiated atom transfer radical polymerization. Self-assembled monolayers of 4'-nitro-1, 1'-biphenyl-4-thiol were structured by chemical lithography which produced cross-linked 4'-amino-1,1'-biphenyl-4-thiol monolayer within a nitro-terminated matrix. The terminal amino groups in monolayers were bounded with the surface initiator bromoisobutyryl bromide. After polymerization, the smallest size can reach to 70-nm line width and dots. The thermosensitivity of poly(N-isopropylacrylamide) brushes is demonstrated by contact angle measurement and fluid atomic force microscopy. This fabrication approach allows creating spatially defined polymer patterns and provides a simple and versatile method to construct complex micro- and nanopatterned polymer brushes with spatial and topographic control in a single step.

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Language(s): eng - English
 Dates: 2006-09-242006-11-202007
 Publication Status: Issued
 Pages: 7
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 Rev. Type: Peer
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Title: Langmuir
Source Genre: Journal
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Publ. Info: Columbus, OH : American Chemical Society
Pages: - Volume / Issue: 23 (7) Sequence Number: - Start / End Page: 3981 - 3987 Identifier: ISSN: 0743-7463
CoNE: https://pure.mpg.de/cone/journals/resource/954925541194