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  Modification of aliphatic self-assembled monolayers by free-radical-dominant plasma: the role of the plasma composition

Weng, C.-C., Liao, J.-D., Wu, Y.-T., Wang, M.-C., Klauser, R., Grunze, M., et al. (2004). Modification of aliphatic self-assembled monolayers by free-radical-dominant plasma: the role of the plasma composition. Langmuir, 20(23), 10093-10099. doi:10.1021/la040058h.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0001-AD9F-A Version Permalink: https://hdl.handle.net/21.11116/0000-0001-ADA0-7
Genre: Journal Article

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Langmuir_20_2004_10093.pdf (Any fulltext), 363KB
 
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 Creators:
Weng, Chih-Chiang, Author
Liao, Jiunn-Der, Author
Wu, Yi-Te, Author
Wang, Ming-Chen, Author
Klauser, Ruth, Author
Grunze, Michael1, Author           
Zharnikov, Michael, Author
Affiliations:
1Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society, ou_2364731              

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 Abstract: Modification of octadecanethiolate self-assembled monolayers on Au by nitrogen-oxygen or argon-oxygen downstream microwave plasma with a low oxygen content (estimated below several percent) has been studied by synchrotron-based high-resolution X-ray photoelectron spectroscopy and water contact angle measurements. For both types of plasma, the primary processes were found to be the loss of conformational and orientational order and the oxidation of the alkyl matrix and headgroup-substrate interface. At the same time, the film modification occurred much faster and with different intermediates for the nitrogen plasma than for the argon plasma. The reasons for these differences are considered in terms of the different reactivities and different efficiencies of the energy transfer between the plasma constituents in these two types of plasma.

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Language(s): eng - English
 Dates: 2004-04-072004-06-222004-10-12
 Publication Status: Issued
 Pages: 7
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1021/la040058h
URI: https://www.ncbi.nlm.nih.gov/pubmed/15518499
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Title: Langmuir
Source Genre: Journal
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Publ. Info: Columbus, OH : American Chemical Society
Pages: - Volume / Issue: 20 (23) Sequence Number: - Start / End Page: 10093 - 10099 Identifier: ISSN: 0743-7463
CoNE: https://pure.mpg.de/cone/journals/resource/954925541194