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  X-ray and low energy electron induced damage in alkanethiolate monolayers on Au-substrates

Jäger, B., Schürmann, H., Müller, H., Himmel, H.-J., Neumann, M., Grunze, M., et al. (1997). X-ray and low energy electron induced damage in alkanethiolate monolayers on Au-substrates. Zeitschrift für Physikalische Chemie, 202(1), 263-272. doi:10.1524/zpch.1997.202.Part_1_2.263.

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Jäger, B., Author
Schürmann, H., Author
Müller, H.U., Author
Himmel, H.-J., Author
Neumann, M., Author
Grunze, M.1, Author           
Wöll, Ch., Author
Affiliations:
1Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society, ou_2364731              

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Free keywords: Self assembled monolayers | Alkanethiolates | X-ray exposure | E-beam damage | NEXAFS
 Abstract: In a previous communication we presented X-ray photoelectron (XP) spectra of alkanethiolate monolayers deposited from solution onto Au-substrates. In the S2p XP-spectra two different sulfur species were detected, and interpreted as evidence for disulfide formation, in agreement with an earlier report using grazing incidence X-ray diffraction (GIXRD) [P. Fenter, A. Eberhardt and P. Eisenberger, Science 266 (1994) 1216]. Here we present new experiments revealing that alkanethiolate monolayers adsorbed on Au exhibit an unexpectedly high cross section for X-ray induced damage. This observation makes a reinterpretation of the previous XPS data necessary, which — together with new data — reveals that the second S-species observed in the previous experiments (which was interpreted to indicate disulfide formation) is due to beam damage. The relevance of this X-ray induced beam-damage for the interpretation of the GIXRD-data will be discussed. Data obtained with soft X-ray absorption spectroscopy (NEXAFS) for alkanethiolate monolayers exposed to low energy electrons in the typical energy range of secondary electrons (E = 0 — 50 eV) reveal the formation of C=C double bonds and provides evidence that the X-ray induced damage is caused by the secondary electrons resulting from the photoemission process.

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Language(s): eng - English
 Dates: 1996-10-011997
 Publication Status: Issued
 Pages: 10
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Degree: -

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Title: Zeitschrift für Physikalische Chemie
  Other : Zeitschrift für Physikalische Chemie : International journal of research in physical chemistry and chemical physics
  Abbreviation : Zeitschr. Phys. Chem.
Source Genre: Journal
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Publ. Info: Oldenbourg : Walter de Gruyter GmbH
Pages: - Volume / Issue: 202 (1) Sequence Number: - Start / End Page: 263 - 272 Identifier: ISSN: 0942-9352
CoNE: https://pure.mpg.de/cone/journals/resource/09429352