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  Chemical nanolithography with electron beams

Gölzhäuser, A., Eck, W., Geyer, W., Stadler, V., Weimann, T., Hinze, P., et al. (2001). Chemical nanolithography with electron beams. Advanced Materials, 13(11), 803-806. doi:10.1002/1521-4095(200106)13:11%3C803:AID-ADMA806%3E3.0.CO;2-W.

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AdvMaterials_13_2001_806.pdf (Any fulltext), 210KB
 
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Gölzhäuser, Armin, Author
Eck, Wolfgang, Author
Geyer, Wolfgang, Author
Stadler, Volker, Author
Weimann, Thomas, Author
Hinze, Peter, Author
Grunze, Michael1, Author           
Affiliations:
1Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society, ou_2364731              

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 Abstract: A highly focused electron beam as the agent for spatially selective reductionof nitro groups to amino groups in a self‐assembled monolayer of aromatics is the key feature of a novel technique in chemical nanolithography presented here. Treatment of the reactive amino groups with different reactants after each e‐beam writing step yields a surface with a defined array of chemically diverse structures; for example, see the line pattern in the Figure.

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Language(s): eng - English
 Dates: 2001-02-012000-10-192001-06-01
 Publication Status: Issued
 Pages: 4
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 Rev. Type: Peer
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Title: Advanced Materials
  Other : Adv. Mater.
Source Genre: Journal
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Publ. Info: Weinheim : Wiley-VCH
Pages: - Volume / Issue: 13 (11) Sequence Number: - Start / End Page: 803 - 806 Identifier: ISSN: 0935-9648
CoNE: https://pure.mpg.de/cone/journals/resource/954925570855