English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT
Add to Basket
 Local TagsRelease HistoryDetailsSummary
  Modification of thiol-derived self-assembling monolayers by electron and x-ray irradiation: Scientific and lithographic aspects

Zharnikov, M., & Grunze, M. (2002). Modification of thiol-derived self-assembling monolayers by electron and x-ray irradiation: Scientific and lithographic aspects. Journal of Vacuum Science and Technology B, 20(5), 1793-1807. doi:10.1116/1.1514665.

Item is

 

show all hide all

Basic

show hide
Item Permalink: https://hdl.handle.net/21.11116/0000-0001-BE3A-9 Version Permalink: https://hdl.handle.net/21.11116/0000-0001-BE3B-8
Genre: Journal Article

Files

show Files
hide Files
:
JVacuumSciTechnolB _20_2002_1793.pdf (Any fulltext), 713KB
 
File Permalink:
-
Name:
JVacuumSciTechnolB _20_2002_1793.pdf
Description:
-
OA-Status:
Visibility:
Restricted (Max Planck Institute for Medical Research, MHMF; )
MIME-Type / Checksum:
application/pdf
Technical Metadata:
Copyright Date:
-
Copyright Info:
-
License:
-

Locators

show
hide
Locator:
http://avs.scitation.org/doi/pdf/10.1116/1.1514665 (Any fulltext)
Description:
-
OA-Status:

Creators

show
hide
 Creators:
Zharnikov, M., Author
Grunze, M.1, Author           
Affiliations:
1Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society, ou_2364731              

Content

show
hide
Free keywords: -
 Abstract: This article reviews recent experiments on the modification of thiol-derived self-assembling monolayers (SAMs) by electron and x-ray irradiation. Several complementary experimental techniques such as near-edge x-ray absorption fine structure spectroscopy, x-ray photoelectron spectroscopy and microscopy, and infrared reflection absorption spectroscopy were applied to gain a detailed knowledge on the nature and extent of irradiation-induced damage in these systems. The reaction of a SAM to electron and x-ray irradiation was found to be determined by the interplay of the damage/decomposition and cross-linking processes. Ways to adjust the balance between these two opposing effects by molecular engineering of the SAM constituents are demonstrated. The presented data provide the physical–chemical basis for electron-beam patterning of self-assembled monolayers to extend lithography down to the nanometer scale.

Details

show
hide
Language(s): eng - English
 Dates: 2002-08-232002-08-262002-10-042002
 Publication Status: Issued
 Pages: 15
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1116/1.1514665
 Degree: -

Event

show

Legal Case

show

Project information

show

Source 1

show
hide
Title: Journal of Vacuum Science and Technology B
  Other : JVST B
  Other : J. Vac. Sci. Techn. B
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: New York : Published by AVS through the American Institute of Physics
Pages: - Volume / Issue: 20 (5) Sequence Number: - Start / End Page: 1793 - 1807 Identifier: ISSN: 0734-2101
CoNE: https://pure.mpg.de/cone/journals/resource/954928495416