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  Electromagnetic Functionalization of Wide‐Bandgap Dielectric Oxides by Boron Interstitial Doping

Park, D., Rees, G. J., Wang, H., Rata, D., Morris, A. J., Maznichenko, I. V., et al. (2018). Electromagnetic Functionalization of Wide‐Bandgap Dielectric Oxides by Boron Interstitial Doping. Advanced Materials, 30(39): 1802025. doi:10.1002/adma.201802025.

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 Creators:
Park, Dae‐Sung1, 2, Author
Rees, Gregory J.3, Author
Wang, Haiyuan4, Author           
Rata, Diana2, Author
Morris, Andrew J.5, Author
Maznichenko, Igor V.2, Author
Ostanin, Sergey2, 6, Author
Bhatnagar, Akash1, 2, Author
Choi, Chel‐Jong7, Author
Jónsson, Ragnar D. B.8, Author
Kaufmann, Kai9, Author
Kashtiban, Reza3, Author
Walker, Marc3, Author
Chiang, Cheng‐Tien2, 6, Author
Thorsteinsson, Einar B.8, Author
Luo, Zhengdong3, Author
Park, In‐Sung10, Author
Hanna, John V.3, Author
Mertig, Ingrid2, 6, Author
Dörr, Kathrin2, Author
Gíslason, Hafliði P.8, AuthorMcConville, Chris F.3, 11, Author more..
Affiliations:
1Zentrum für Innovationskompetenz SiLi-nano, 06120 Halle, Germany, ou_persistent22              
2Institut für Physik, Martin-Luther-Universität Halle-Wittenberg, 06120 Halle, Germany, ou_persistent22              
3Department of Physics, University of Warwick, Coventry CV4 7AL, UK, ou_persistent22              
4Theory, Fritz Haber Institute, Max Planck Society, ou_634547              
5School of Metallurgy and Materials, University of Birmingham, B15 2TT Birmingham, UK, ou_persistent22              
6Max-Planck-Institut für Mikrostrukturphysik, 06120 Halle, Germany, ou_persistent22              
7School of Semiconductor and Chemical Engineering, Chonbuk National University, Jeonju 54596, Republic of Korea, ou_persistent22              
8Science institute, University of Iceland, Reykjavik IS-104, Iceland, ou_persistent22              
9Fraunhofer Center for Silicon Photovoltaics CSP, Halle 06120 , Germany, ou_persistent22              
10Institute of Nano Science and Technology, Hanyang University, Seoul 04763, Republic of Korea, ou_persistent22              
11College of Science, Engineering & Health, RMIT University, Melbourne, VIC 3000, Australia, ou_persistent22              

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 Abstract: A surge in interest of oxide‐based materials is testimony for their potential utility in a wide array of device applications and offers a fascinating landscape for tuning the functional properties through a variety of physical and chemical parameters. In particular, selective electronic/defect doping has been demonstrated to be vital in tailoring novel functionalities, not existing in the bulk host oxides. Here, an extraordinary interstitial doping effect is demonstrated centered around a light element, boron (B). The host matrix is a novel composite system, made from discrete bulk LaAlO3:LaBO3 compounds. The findings show a spontaneous ordering of the interstitial B cations within the host LaAlO3 lattices, and subsequent spin‐polarized charge injection into the neighboring cations. This leads to a series of remarkable cation‐dominated electrical switching and high‐temperature ferromagnetism. Hence, the induced interstitial doping serves to transform a nonmagnetic insulating bulk oxide into a ferromagnetic ionic–electronic conductor. This unique interstitial B doping effect upon its control is proposed to be as a general route for extracting/modifying multifunctional properties in bulk oxides utilized in energy and spin‐based applications.

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Language(s): eng - English
 Dates: 2018-07-052018-03-292018-09-242018-09-26
 Publication Status: Issued
 Pages: 9
 Publishing info: -
 Table of Contents: -
 Rev. Type: No review
 Identifiers: DOI: 10.1002/adma.201802025
 Degree: -

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Title: Advanced Materials
  Other : Adv. Mater.
Source Genre: Journal
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Publ. Info: Weinheim : Wiley-VCH
Pages: 9 Volume / Issue: 30 (39) Sequence Number: 1802025 Start / End Page: - Identifier: ISSN: 0935-9648
CoNE: https://pure.mpg.de/cone/journals/resource/954925570855