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  Application of transient CHI plasma startup to future ST and AT devices

Hammond, K. C., Raman, R., & Jardin, S. C. (2019). Application of transient CHI plasma startup to future ST and AT devices. Physics of Plasmas, 26: 032501. doi:10.1063/1.5087259.

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https://doi.org/10.1063/1.5087259 (Publisher version)
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 Creators:
Hammond, K. C.1, Author              
Raman, R.2, Author
Jardin, S. C.2, Author
Affiliations:
1Stellarator Edge and Divertor Physics (E4), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856286              
2External Organizations, ou_persistent22              

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Language(s): eng - English
 Dates: 20182019
 Publication Status: Published in print
 Pages: 10 p.
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1063/1.5087259
 Degree: -

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Title: Physics of Plasmas
Source Genre: Journal
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Publ. Info: Melville, NY : AIP Publishing
Pages: - Volume / Issue: 26 Sequence Number: 032501 Start / End Page: - Identifier: ISSN: 1070-664X
CoNE: https://pure.mpg.de/cone/journals/resource/1000000000318080