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  Thermal annealing induced competition of oxidation and grain growth in nickel thin films

Raghavan, L., Ojha, S., Sulania, I., Mishra, N. C., Ranjith, K. M., Baenitz, M., et al. (2019). Thermal annealing induced competition of oxidation and grain growth in nickel thin films. Thin Solid Films, 680, 40-47. doi:10.1016/j.tsf.2019.04.034.

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Item Permalink: http://hdl.handle.net/21.11116/0000-0003-8CDE-6 Version Permalink: http://hdl.handle.net/21.11116/0000-0003-8DDC-7
Genre: Journal Article

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 Creators:
Raghavan, Lisha1, Author
Ojha, Sunil1, Author
Sulania, Indra1, Author
Mishra, N. C.1, Author
Ranjith, K. M.2, Author              
Baenitz, M.3, Author              
Kanjilal, D.1, Author
Affiliations:
1External Organizations, ou_persistent22              
2Physics of Quantum Materials, Max Planck Institute for Chemical Physics of Solids, Max Planck Society, ou_1863462              
3Michael Baenitz, Physics of Quantum Materials, Max Planck Institute for Chemical Physics of Solids, Max Planck Society, ou_1863471              

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Free keywords: Nickel, Nickel oxide, Rutherford backscattering spectrometry, Magnetic domain, Field cooled measurements, Zero field cooled measurements
 Abstract: The interface of Ni-NiO thin films was developed by thermal evaporation of nickel and subsequent annealing in oxygen atmosphere at 400 °C at varying duration of time. The evolution of layer thicknesses with annealing time was studied using rutherford backscattering spectrometry. The structural characterization showed grain growth stagnation for Ni at higher duration of annealing. The Ni phase had more crystallinity compared to the NiO phase. The surface was studied using atomic force microscope. The magnetic domains were also imaged. Magnetic stripe domain patterns were observed for selected films. Variation in saturation magnetisation and coercivity with annealing time was observed. The observation of weak exchange bias shows the importance of antiferromagnetic phase in determining the exchange bias properties. Thermal annealing of Ni films caused a competition among oxidation and grain growth.

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Language(s): eng - English
 Dates: 2019-05-012019-05-01
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: -
 Identifiers: DOI: 10.1016/j.tsf.2019.04.034
 Degree: -

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Title: Thin Solid Films
  Abbreviation : Thin Solid Films
Source Genre: Journal
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Publ. Info: Lausanne, Switzerland, etc. : Elsevier
Pages: - Volume / Issue: 680 Sequence Number: - Start / End Page: 40 - 47 Identifier: ISSN: 0040-6090
CoNE: https://pure.mpg.de/cone/journals/resource/954925449792