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  Effect of bias voltage on microstructure and optical properties of Al2O3 thin films prepared by twin targets reactive high power impulse magnetron sputtering

Zhou, G., Wang, L., Wang, X., Yu, Y., & Mutzke, A. (2019). Effect of bias voltage on microstructure and optical properties of Al2O3 thin films prepared by twin targets reactive high power impulse magnetron sputtering. Vacuum, 166, 88-96. doi:10.1016/j.vacuum.2019.04.060.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0003-ADFA-1 Version Permalink: https://hdl.handle.net/21.11116/0000-0006-5A9A-8
Genre: Journal Article

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 Creators:
Zhou, G.1, Author
Wang, L.1, Author
Wang, X.1, Author
Yu, Y.1, Author
Mutzke, A.2, Author           
Affiliations:
1External Organizations, ou_persistent22              
2Stellarator Theory (ST), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856287              

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Language(s): eng - English
 Dates: 20192019
 Publication Status: Issued
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 Rev. Type: Peer
 Identifiers: DOI: 10.1016/j.vacuum.2019.04.060
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Title: Vacuum
Source Genre: Journal
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Publ. Info: Amsterdam : Elsevier B.V.
Pages: - Volume / Issue: 166 Sequence Number: - Start / End Page: 88 - 96 Identifier: ISSN: 0042-207X
CoNE: https://pure.mpg.de/cone/journals/resource/954925450829