Influence of external plasma on ICRF voltage stand-off

Casagrande, R.; Timko, H.; Sjobaek, K. N.; Wauters, T.; Noterdaeme, J.-M.

Local TagsRelease HistoryDetailsSummary

Influence of external plasma on ICRF voltage stand-off

Casagrande, R., Timko, H., Sjobaek, K. N., Wauters, T., & Noterdaeme, J.-M. (2019). Influence of external plasma on ICRF voltage stand-off. Poster presented at 23rd Topical Conference on Radiofrequency Power in Plasmas (RFPPC 2019), Hefei.

Item is Released

show all

Basic

hide

Item Permalink: https://hdl.handle.net/21.11116/0000-0003-DFC1-8 Version Permalink: https://hdl.handle.net/21.11116/0000-0007-1F46-9

Genre: Poster

Files

show Files

Locators

show

Creators

hide

Creators:
Casagrande, R.^{1, 2}, Author
Timko, H.², Author
Sjobaek, K. N.², Author
Wauters, T.², Author
Noterdaeme, J.-M.^{1, 2}, Author

Affiliations:
1Tokamak Scenario Development (E1), Max Planck Institute for Plasma Physics, Max Planck Society, ou_1856321
2External Organizations, ou_persistent22

Content

show

Details

hide

Language(s): eng - English

Dates: Created: 2019

Publication Status: Not specified

Pages: -

Publishing info: -

Table of Contents: -

Rev. Type: -

Identifiers: -

Degree: -

Event

hide

Title: 23rd Topical Conference on Radiofrequency Power in Plasmas (RFPPC 2019)

Place of Event: Hefei

Start-/End Date: 2019-05-14 - 2019-05-17

Legal Case

show

Project information

show

Source

show