English
 
User Manual Privacy Policy Disclaimer Contact us
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT
  Electron microscopic investigation of the influence of plasma parameters on VOx films deposited by a plasma ion assisted process

Frank, A., Dias, M., Hieke, S. W., Kruth, A., & Scheu, C. (2019). Electron microscopic investigation of the influence of plasma parameters on VOx films deposited by a plasma ion assisted process. Talk presented at E-MRS 2019 Spring Meeting. Nice, France. 2019-05-27 - 2019-05-31.

Item is

Basic

show hide
Item Permalink: http://hdl.handle.net/21.11116/0000-0004-595C-2 Version Permalink: http://hdl.handle.net/21.11116/0000-0004-595D-1
Genre: Talk

Files

show Files

Locators

show

Creators

show
hide
 Creators:
Frank, Anna1, Author              
Dias, Miguel2, Author              
Hieke, Stefan Werner1, Author              
Kruth, Angela3, Author              
Scheu, Christina1, Author              
Affiliations:
1Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_2054294              
2INP Greifswald – Leibniz Institute for Plasma Science and Technology, 17489 Greifswald, Germany, ou_persistent22              
3Leibniz Institute for Plasma Science and Technology, 17489 Greifswald, Germany, ou_persistent22              

Content

show

Details

show
hide
Language(s): eng - English
 Dates: 2019-05
 Publication Status: Not specified
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: -
 Identifiers: -
 Degree: -

Event

show
hide
Title: E-MRS 2019 Spring Meeting
Place of Event: Nice, France
Start-/End Date: 2019-05-27 - 2019-05-31

Legal Case

show

Project information

show

Source

show