Electron microscopic investigation of the influence of plasma parameters on VOx 
films deposited by a plasma ion assisted process

Frank, Anna; Dias, Miguel; Hieke, Stefan Werner; Kruth, Angela; Scheu, Christina

Local TagsRelease HistoryDetailsSummary

Electron microscopic investigation of the influence of plasma parameters on VOx films deposited by a plasma ion assisted process

Frank, A., Dias, M., Hieke, S. W., Kruth, A., & Scheu, C. (2019). Electron microscopic investigation of the influence of plasma parameters on VOx films deposited by a plasma ion assisted process. Talk presented at E-MRS 2019 Spring Meeting. Nice, France. 2019-05-27 - 2019-05-31.

Item is Released

show all hide all

Basic

show hide

Item Permalink: https://hdl.handle.net/21.11116/0000-0004-595C-2 Version Permalink: https://hdl.handle.net/21.11116/0000-0004-595D-1

Genre: Talk

Files

show Files

Locators

show

Creators

show

hide

Creators:
Frank, Anna¹, Author
Dias, Miguel², Author
Hieke, Stefan Werner¹, Author
Kruth, Angela³, Author
Scheu, Christina¹, Author

Affiliations:
1Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_2054294
2INP Greifswald – Leibniz Institute for Plasma Science and Technology, 17489 Greifswald, Germany, ou_persistent22
3Leibniz Institute for Plasma Science and Technology, 17489 Greifswald, Germany, ou_persistent22

Content

show

Details

show

hide

Language(s): eng - English

Dates: Created: 2019-05

Publication Status: Not specified

Pages: -

Publishing info: -

Table of Contents: -

Rev. Type: -

Identifiers: -

Degree: -

Event

show

hide

Title: E-MRS 2019 Spring Meeting

Place of Event: Nice, France

Start-/End Date: 2019-05-27 - 2019-05-31

Legal Case

show

Project information

show

Source

show