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  Preferential sputtering effects in depth profiling of multilayers with SIMS, XPS and AES

Hofmann, S., Zhou, G., Kovac, J., Drev, S., Lian, S. Y., Lin, B., et al. (2019). Preferential sputtering effects in depth profiling of multilayers with SIMS, XPS and AES. Applied Surface Science, 483, 140-155. doi:10.1016/j.apsusc.2019.03.211.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0004-58D1-D Version Permalink: https://hdl.handle.net/21.11116/0000-0004-58D2-C
Genre: Journal Article

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 Creators:
Hofmann, S.1, 2, Author           
Zhou, G.2, Author
Kovac, J.3, Author
Drev, S.3, Author
Lian, S. Y.2, Author
Lin, B.2, Author
Liu, Y.2, Author
Wang, J. Y.2, Author
Affiliations:
1Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497650              
2Department of Physics, Shantou University, 243 Daxue Road, Shantou 515063, Guangdong, China, ou_persistent22              
3Jozef Stefan Institute, Jamova cesta 39, 1000 Ljubljana, Slovenia, ou_persistent22              

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Free keywords: Emeriti and Others
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Language(s): eng - English
 Dates: 2019-03-282019-07-31
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1016/j.apsusc.2019.03.211
 Degree: -

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Title: Applied Surface Science
  Abbreviation : Appl. Surf. Sci.
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: Amsterdam : Elsevier B.V.
Pages: - Volume / Issue: 483 Sequence Number: - Start / End Page: 140 - 155 Identifier: ISSN: 0169-4332
CoNE: https://pure.mpg.de/cone/journals/resource/954928576736