Thermal conductivity of titanium aluminum silicon nitride coatings deposited by 
lateral rotating cathode arc

Samani, M. K.; Ding, X. Z.; Amini, Shahrouz; Khosravian, N.; Cheong, J. Y.; Chen, G.; Tay, B. K.

doi:10.1016/j.tsf.2013.04.029

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Thermal conductivity of titanium aluminum silicon nitride coatings deposited by lateral rotating cathode arc

Samani, M. K., Ding, X. Z., Amini, S., Khosravian, N., Cheong, J. Y., Chen, G., et al. (2013). Thermal conductivity of titanium aluminum silicon nitride coatings deposited by lateral rotating cathode arc. Thin Solid Films, 537, 108-112. doi:10.1016/j.tsf.2013.04.029.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0005-FD43-3 Version Permalink: https://hdl.handle.net/21.11116/0000-0005-FD44-2

Genre: Journal Article

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Samani, M. K., Author
Ding, X. Z., Author
Amini, Shahrouz¹, Author
Khosravian, N., Author
Cheong, J. Y., Author
Chen, G., Author
Tay, B. K., Author

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1External Organizations, ou_persistent22

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Dates: Date issued: 2013-06-30

Publication Status: Issued

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Identifiers: ISI: 000319456400016
DOI: 10.1016/j.tsf.2013.04.029

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Title: Thin Solid Films

Abbreviation : Thin Solid Films

Source Genre: Journal

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Publ. Info: Lausanne, Switzerland, etc. : Elsevier

Pages: - Volume / Issue: 537 Sequence Number: - Start / End Page: 108 - 112 Identifier: ISSN: 0040-6090