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  A UHV-compatible photoelectron emission microscope for applications in surface science

Engel, W., Kordesch, M. E., Rotermund, H.-H., Kubala, S., & Oertzen, A. v. (1991). A UHV-compatible photoelectron emission microscope for applications in surface science. Ultramicroscopy, 36(1-3), 148-153. doi:10.1016/0304-3991(91)90146-W.

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 Creators:
Engel, Wilfried1, Author           
Kordesch, Martin E.2, Author           
Rotermund, Harm-Hinrich3, Author           
Kubala, Sven3, Author           
Oertzen, Alexander von3, Author           
Affiliations:
1Inorganic Chemistry, Fritz Haber Institute, Max Planck Society, ou_24023              
2Fritz Haber Institute, Max Planck Society, ou_24021              
3Physical Chemistry, Fritz Haber Institute, Max Planck Society, ou_634546              

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 Abstract: A three-stage electrostatic photoelectron emission microscope (PEEM) for use as an attachment on a UHV surface analysis chamber is described. The PEEM is intended for surface studies with lateral resolution of the order of 0 1 pm where the real-time observation of processes is important.

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 Dates: 1990-08-111990-12-011991-05
 Publication Status: Issued
 Pages: 6
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1016/0304-3991(91)90146-W
 Degree: -

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Title: Ultramicroscopy
  Abbreviation : Ultramicroscopy
Source Genre: Journal
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Publ. Info: Amsterdam : North-Holland
Pages: 6 Volume / Issue: 36 (1-3) Sequence Number: - Start / End Page: 148 - 153 Identifier: ISSN: 0304-3991
CoNE: https://pure.mpg.de/cone/journals/resource/954925512451