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  Excitation wavelength independent sensitized Er3+ concentration in as-deposited and low temperature annealed Si-rich SiO2 films

Savchyn, O., Todi, R. M., Coffey, K. R., Ono, L. K., Roldan Cuenya, B., & Kik, P. G. (2009). Excitation wavelength independent sensitized Er3+ concentration in as-deposited and low temperature annealed Si-rich SiO2 films. Applied Physics Letters, 95(23): 231109. doi:10.1063/1.3272271.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0006-D1C2-2 Version Permalink: https://hdl.handle.net/21.11116/0000-0008-314C-C
Genre: Journal Article

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 Creators:
Savchyn, Oleksandr1, Author
Todi, Ravi M.2, Author
Coffey, Kevin R.2, 3, Author
Ono, Luis K.3, Author
Roldan Cuenya, Beatriz3, Author           
Kik, Pieter G.1, 3, Author
Affiliations:
1CREOL, The College of Optics and Photonics, University of Central Florida, Orlando, Florida 32816, USA, ou_persistent22              
2Advanced Materials Processing and Analysis Center (AMPAC), University of Central Florida, Orlando, Florida 32816, USA, ou_persistent22              
3Physics Department, University of Central Florida, ou_persistent22              

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 Abstract: Erbium sensitization is observed in as-deposited Er3+ doped Si-rich SiO2, ruling out the involvement of Si nanocrystals in the Er3+ excitation in these samples. The Er3+excitation cross section in this material is similar within a factor 3 to that of samples annealed at 600 ° C under 355 and 532 nm excitation. The density of sensitized Er3+ ions is shown to be excitation wavelength independent, while the shape of the Er3+ excitation spectra is governed by a wavelength dependent Er3+ excitation cross section. These findings enable the use of a broad range of wavelengths for the efficient excitation of this gain medium.

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Language(s): eng - English
 Dates: 2009-07-032009-11-162009-12-092009-12
 Publication Status: Issued
 Pages: 3
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1063/1.3272271
 Degree: -

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Title: Applied Physics Letters
  Abbreviation : Appl. Phys. Lett.
Source Genre: Journal
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Publ. Info: Melville, NY : American Institute of Physics
Pages: 3 Volume / Issue: 95 (23) Sequence Number: 231109 Start / End Page: - Identifier: ISSN: 0003-6951
CoNE: https://pure.mpg.de/cone/journals/resource/954922836223