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  Thermal etching of GaAs (1 1 3) surfaces

Scholz, S. M., Setzer, C., Jacobi, K., Schabert, F., & Rabe, J. P. (1998). Thermal etching of GaAs (1 1 3) surfaces. Journal of Materials Science: Materials in Electronics, 9, 115-119. doi:10.1023/A:1008857321897.

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 Creators:
Scholz, Stefan M.1, Author           
Setzer, Carsten1, Author           
Jacobi, Karl1, Author           
Schabert, F.2, Author
Rabe, Jürgen P.2, Author
Affiliations:
1Physical Chemistry, Fritz Haber Institute, Max Planck Society, ou_634546              
2Humboldt-Universität zu Berlin, Germany, ou_persistent22              

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 Abstract: We discuss scanning electron micrographs and atomic force microscope images of thermally etched GaAs(1 1 3) surfaces. The GaAs(1 1 3)A and GaAs(1 1 3)B surfaces are compared. The polarity of the surface leads to a different morphology for the two surfaces after thermal etching. It is found that the Ga-enriched droplets, which form under As-deficient conditions at higher temperatures, are sitting on characteristic pedestals, which are different for the two faces. The facets occurring after this thermal etching process are identified. They represent thermally favourable surfaces under the arsenic-deficient conditions of the thermal etching process.

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Language(s): eng - English
 Dates: 1997-07-181997-11-081998-03
 Publication Status: Issued
 Pages: 5
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1023/A:1008857321897
 Degree: -

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Title: Journal of Materials Science: Materials in Electronics
  Other : J. Mater. Sci. - Mater. El.
Source Genre: Journal
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Publ. Info: Norwell, MA : Springer
Pages: 5 Volume / Issue: 9 Sequence Number: - Start / End Page: 115 - 119 Identifier: ISSN: 0957-4522
CoNE: https://pure.mpg.de/cone/journals/resource/954925577043