English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT
  Molecular beam epitaxy of the half-Heusler antiferromagnet CuMnSb

Scheffler, L., Gas, K., Banik, S., Kamp, M., Knobel, J., Lin, H., et al. (2020). Molecular beam epitaxy of the half-Heusler antiferromagnet CuMnSb. Physical Review Materials, 4(11): 114402, pp. 1-6. doi:10.1103/PhysRevMaterials.4.114402.

Item is

Basic

show hide
Genre: Journal Article

Files

show Files

Locators

show

Creators

show
hide
 Creators:
Scheffler, L.1, Author
Gas, K.1, Author
Banik, S.1, Author
Kamp, M.1, Author
Knobel, J.1, Author
Lin, H.2, Author              
Schumacher, C.1, Author
Gould, C.1, Author
Sawicki, M.1, Author
Kleinlein, J.1, Author
Molenkamp, L. W.3, Author              
Affiliations:
1External Organizations, ou_persistent22              
2Inorganic Chemistry, Max Planck Institute for Chemical Physics of Solids, Max Planck Society, ou_1863425              
3Laurens Molenkamp, Max Planck Fellow, Max Planck Institute for Chemical Physics of Solids, Max Planck Society, ou_3266847              

Content

show
hide
Free keywords: -
 Abstract: We report the growth of CuMnSb thin films by molecular beam epitaxy on InAs (001) substrates. The CuMnSb layers are compressively strained (0.6 %) due to lattice mismatch. The thin films have a CO full width at halfmaximum of 7.7 arcsec according to high resolution x-ray diffraction, and a root-mean-square roughness of 0.14 nm as determined by atomic force microscopy. Magnetic and electrical properties are found to be consistent with reported values from bulk samples. We find a Neel temperature of 62 K, a Curie-Weiss temperature of -65 K, and an effective moment of 5.9 mu B/f.u. Transport measurements confirm the antiferromagnetic transition and show a residual resistivity at 4 K of 35 mu Omega cm.

Details

show
hide
Language(s): eng - English
 Dates: 2020-11-022020-11-02
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: DOI: 10.1103/PhysRevMaterials.4.114402
 Degree: -

Event

show

Legal Case

show

Project information

show

Source 1

show
hide
Title: Physical Review Materials
  Abbreviation : Phys. Rev. Mat.
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: College Park, MD : American Physical Society
Pages: - Volume / Issue: 4 (11) Sequence Number: 114402 Start / End Page: 1 - 6 Identifier: ISSN: 2475-9953
CoNE: https://pure.mpg.de/cone/journals/resource/2475-9953