Molecular beam epitaxy of the half-Heusler antiferromagnet CuMnSb

Scheffler, L.; Gas, K.; Banik, S.; Kamp, M.; Knobel, J.; Lin, H.; Schumacher, C.; Gould, C.; Sawicki, M.; Kleinlein, J.; Molenkamp, L. W.

doi:10.1103/PhysRevMaterials.4.114402

Local TagsRelease HistoryDetailsSummary

Molecular beam epitaxy of the half-Heusler antiferromagnet CuMnSb

Scheffler, L., Gas, K., Banik, S., Kamp, M., Knobel, J., Lin, H., et al. (2020). Molecular beam epitaxy of the half-Heusler antiferromagnet CuMnSb. Physical Review Materials, 4(11): 114402, pp. 1-6. doi:10.1103/PhysRevMaterials.4.114402.

Item is Released

show all hide all

Basic

show hide

Item Permalink: https://hdl.handle.net/21.11116/0000-0007-7B7A-7 Version Permalink: https://hdl.handle.net/21.11116/0000-0007-7F41-2

Genre: Journal Article

Files

show Files

Locators

show

Creators

show

hide

Creators:
Scheffler, L.¹, Author
Gas, K.¹, Author
Banik, S.¹, Author
Kamp, M.¹, Author
Knobel, J.¹, Author
Lin, H.², Author
Schumacher, C.¹, Author
Gould, C.¹, Author
Sawicki, M.¹, Author
Kleinlein, J.¹, Author
Molenkamp, L. W.³, Author

Affiliations:
1External Organizations, ou_persistent22
2Inorganic Chemistry, Max Planck Institute for Chemical Physics of Solids, Max Planck Society, ou_1863425
3Laurens Molenkamp, Max Planck Fellow, Max Planck Institute for Chemical Physics of Solids, Max Planck Society, ou_3266847

Content

show

hide

Free keywords: -

Abstract: We report the growth of CuMnSb thin films by molecular beam epitaxy on InAs (001) substrates. The CuMnSb layers are compressively strained (0.6 %) due to lattice mismatch. The thin films have a CO full width at halfmaximum of 7.7 arcsec according to high resolution x-ray diffraction, and a root-mean-square roughness of 0.14 nm as determined by atomic force microscopy. Magnetic and electrical properties are found to be consistent with reported values from bulk samples. We find a Neel temperature of 62 K, a Curie-Weiss temperature of -65 K, and an effective moment of 5.9 mu B/f.u. Transport measurements confirm the antiferromagnetic transition and show a residual resistivity at 4 K of 35 mu Omega cm.

Details

show

hide

Language(s): eng - English

Dates: Published Online: 2020-11-02Date issued: 2020-11-02

Publication Status: Issued

Pages: -

Publishing info: -

Table of Contents: -

Rev. Type: -

Identifiers: DOI: 10.1103/PhysRevMaterials.4.114402

Degree: -

Event

show

Legal Case

show

Project information

show

Source 1

show

hide

Title: Physical Review Materials

Abbreviation : Phys. Rev. Mat.

Source Genre: Journal

Creator(s):

Affiliations:

Publ. Info: College Park, MD : American Physical Society

Pages: - Volume / Issue: 4 (11) Sequence Number: 114402 Start / End Page: 1 - 6 Identifier: ISSN: 2475-9953
CoNE: https://pure.mpg.de/cone/journals/resource/2475-9953