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  Carbon nitride thin films as all-in-one technology for photocatalysis

Mazzanti, S., Manfredi, G., Barker, A. J., Antonietti, M., Savateev, A., & Giusto, P. (2021). Carbon nitride thin films as all-in-one technology for photocatalysis. ACS Catalysis, 11(17), 11109-11116. doi:10.1021/acscatal.1c02909.

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 Creators:
Mazzanti, Stefano1, Author              
Manfredi, Giovanni, Author
Barker, Alex J., Author
Antonietti, Markus2, Author              
Savateev, Aleksandr1, Author              
Giusto, Paolo3, Author              
Affiliations:
1Aleksandr Savateev, Kolloidchemie, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_2421702              
2Markus Antonietti, Kolloidchemie, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_1863321              
3Paolo Giusto, Kolloidchemie, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_3245192              

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Free keywords: Carbon nitride; Chemical vapor deposition, Flow chemistry; Photocatalysis, Thin films
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Language(s): eng - English
 Dates: 2021-08-202021
 Publication Status: Published in print
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Title: ACS Catalysis
  Abbreviation : ACS Catal.
Source Genre: Journal
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Publ. Info: Washington, DC : ACS
Pages: - Volume / Issue: 11 (17) Sequence Number: - Start / End Page: 11109 - 11116 Identifier: ISSN: 2155-5435

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Title: ChemRxiv
Source Genre: Journal
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Publ. Info: Washington, Frankfurt am Main, Cambridge : ACS, CCS, CSJ, GDCh, RSC
Pages: - Volume / Issue: - Sequence Number: 14198357 Start / End Page: - Identifier: ZDB: 2949094-7