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  Combining nanostructuration with boron doping to alter sub band gap acceptor states in diamond materials

Choudhury, S., Kiendl, B., Ren, J., Gao, F., Knittel, P., Nebel, C., et al. (2018). Combining nanostructuration with boron doping to alter sub band gap acceptor states in diamond materials. Journal of Materials Chemistry A, 6(34), 16645-16654. doi:10.1039/C8TA05594G.

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 Creators:
Choudhury, Sneha1, Author
Kiendl, Benjamin1, Author
Ren, Jian1, Author
Gao, Fang2, Author           
Knittel, Peter1, Author
Nebel, Christoph1, Author
Venerosy, Amelie1, Author
Girard, Hugues1, Author
Arnault, Jean-Charl1, Author
Krueger, Anke1, Author
Larsson, Karin1, Author
Petit, Tristan1, Author
Affiliations:
1External Organizations, ou_persistent22              
2Nano-Systems from Ions, Spins and Electrons, Max Planck Institute of Microstructure Physics, Max Planck Society, Weinberg 2, 06120 Halle, DE, ou_3287476              

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 Abstract: Diamond is a promising metal-free photocatalyst for nitrogen and carbon dioxide reduction in aqueous environment owing to the possibility of emitting highly reducing solvated electrons. However, the wide band gap of diamond necessitates the use of deep UV to trigger a photochemical reaction. Boron doping introduces acceptor levels within the band gap of diamonds, which may facilitate visible-light absorption through defect-based transitions. In this work, unoccupied electronic states from different boron-doped diamond materials, including single crystal, polycrystalline film, diamond foam, and nanodiamonds were probed by soft X-ray absorption spectroscopy at the carbon K edge. Supported by density functional theory calculations, we demonstrate that boron close to the surfaces of diamond crystallites induce acceptor levels in the band gap, which are dependent on the diamond morphology. Combining boron-doping with morphology engineering, this work thus demonstrates that electron acceptor states within the diamond band gap can be controlled.

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 Dates: 2018-08-092018-09-14
 Publication Status: Issued
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 Identifiers: BibTex Citekey: P13669
DOI: 10.1039/C8TA05594G
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Title: Journal of Materials Chemistry A
  Abbreviation : J. Mater. Chem. A
Source Genre: Journal
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Publ. Info: Cambridge, UK : Royal Society of Chemistry
Pages: - Volume / Issue: 6 (34) Sequence Number: - Start / End Page: 16645 - 16654 Identifier: ISSN: 2050-7488
CoNE: https://pure.mpg.de/cone/journals/resource/2050-7488