Artifacts in multilayer depth profiling: Origin and quantification of a double 
peak layer profile of Ag in ToF-SIMS depth profiles of an Ag/Ni multilayer

Hofmann, S.; Yang, H.; Kovač, J.; Ekard, J.; Song, Y. B.; Wang, J. Y.

doi:10.1016/j.matchar.2020.110774

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Artifacts in multilayer depth profiling: Origin and quantification of a double peak layer profile of Ag in ToF-SIMS depth profiles of an Ag/Ni multilayer

Hofmann, S., Yang, H., Kovač, J., Ekard, J., Song, Y. B., & Wang, J. Y. (2021). Artifacts in multilayer depth profiling: Origin and quantification of a double peak layer profile of Ag in ToF-SIMS depth profiles of an Ag/Ni multilayer. Materials Characterization, 171: 110774. doi:10.1016/j.matchar.2020.110774.

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Item Permalink: https://hdl.handle.net/21.11116/0000-0008-7322-0 Version Permalink: https://hdl.handle.net/21.11116/0000-0008-7323-F

Genre: Journal Article

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Creators:
Hofmann, S.^{1, 2}, Author
Yang, H.³, Author
Kovač, J.⁴, Author
Ekard, J.^{4, 5}, Author
Song, Y. B.³, Author
Wang, J. Y.¹, Author

Affiliations:
1Department of Physics, Shantou University, 243 Daxue Road, Shantou, 515063, Guangdong, China, ou_persistent22
2Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497650
3Department of Chemistry, Shantou University, 243 Daxue Road, Shantou, 515063, Guangdong, China, ou_persistent22
4Department of Surface Engineering, Jozef Stefan Institute, Jamova cesta 39, 1000 Ljubljana, Slovenia, ou_persistent22
5Jozef Stefan International Postgraduate School, Jamova cesta 39, 1000 Ljubljana, Slovenia, ou_persistent22

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Free keywords: Emeriti and Others

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Language(s): eng - English

Dates: Published Online: 2020-11-21Date issued: 2021-01

Publication Status: Issued

Pages: 7

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Table of Contents: -

Rev. Type: Peer

Identifiers: DOI: 10.1016/j.matchar.2020.110774

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Title: Materials Characterization

Abbreviation : Mater. Charact.

Source Genre: Journal

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Publ. Info: Amsterdam : Elsevier

Pages: - Volume / Issue: 171 Sequence Number: 110774 Start / End Page: - Identifier: ISSN: 1044-5803
CoNE: https://pure.mpg.de/cone/journals/resource/954928499483