From epitaxially grown thin films to grain boundary analysis in Cu and Ti

Devulapalli, Vivek; Frommeyer, Lena; Ghidelli, Matteo; Liebscher, Christian; Dehm, Gerhard

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From epitaxially grown thin films to grain boundary analysis in Cu and Ti

Devulapalli, V., Frommeyer, L., Ghidelli, M., Liebscher, C., & Dehm, G. (2019). From epitaxially grown thin films to grain boundary analysis in Cu and Ti. Poster presented at International Workshop on Advanced and In-situ Microscopies of Functional Nanomaterials and Devices, IAMNano, Düsseldorf, Germany.

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Datensatz-Permalink: https://hdl.handle.net/21.11116/0000-0008-D5FA-E Versions-Permalink: https://hdl.handle.net/21.11116/0000-0009-D554-8

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Urheber:
Devulapalli, Vivek¹, Autor
Frommeyer, Lena¹, Autor
Ghidelli, Matteo², Autor
Liebscher, Christian¹, Autor
Dehm, Gerhard³, Autor

Affiliations:
1Advanced Transmission Electron Microscopy, Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863399
2Thin Films and Nanostructured Materials, Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_3274276
3Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863398