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  In-situ detection of stress in oxide films during Si electrodissolution in acidic fluoride electrolytes

Cattarin, S., Decker, F., Dini, D., & Margesin, B. (1999). In-situ detection of stress in oxide films during Si electrodissolution in acidic fluoride electrolytes. Journal of Electroanalytical Chemistry, 474(2), 182-187. doi:10.1016/S0022-0728(99)00348-4.

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 Creators:
Cattarin, Sandro1, Author
Decker, Franco2, Author
Dini, Danilo3, Author           
Margesin, Benno4, Author
Affiliations:
1IPELP-C.N.R., Corso Stati Uniti 4, Italy, ou_persistent22              
2Dipartimento di Chimica, Università La Sapienza, Italy, ou_persistent22              
3Physical Chemistry, Fritz Haber Institute, Max Planck Society, ou_634546              
4IRST, Microsensors and Systems Integration Division, Italy, ou_persistent22              

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 Abstract: We report on the in-situ determination of stress in anodic oxide films produced during electrodissolution of silicon crystalline electrodes in acidic fluoride media. The characterization is accomplished with the bending beam method (BBM) using thin (35 μm) Si cantilever electrodes. The oxide stress has been calculated with an improved version of Stoney’s equation which takes into account the difference of Young’s modulus between silicon substrate and oxide layer. The stress is about 220 MPa for very thin oxide films (t<10 nm). Various possible contributions to electrode bending — oxide stress, surface tension effects and film electrostriction — are considered and their relative incidence is then discussed. Analysis of the curvature signal detected during the occurrence of the electrochemical oscillations results in a better understanding of the phenomena.

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Language(s): eng - English
 Dates: 1999-06-231999-03-151999-07-301999-09-27
 Publication Status: Issued
 Pages: 6
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1016/S0022-0728(99)00348-4
 Degree: -

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Title: Journal of Electroanalytical Chemistry
  Other : J. Electroanal. Chem.
  Other : Journal of Electroanalytical Chemistry and Interfacial Electrochemistry
Source Genre: Journal
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Publ. Info: Amsterdam : Elsevier
Pages: 6 Volume / Issue: 474 (2) Sequence Number: - Start / End Page: 182 - 187 Identifier: ISSN: 0022-0728
CoNE: https://pure.mpg.de/cone/journals/resource/954928572675