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  Spontaneous fluctuations in a plasma ion assisted deposition – correlation between deposition conditions and vanadium oxide thin film growth

Frank, A., Dias, M., Hieke, S. W., Kruth, A., & Scheu, C. (2021). Spontaneous fluctuations in a plasma ion assisted deposition – correlation between deposition conditions and vanadium oxide thin film growth. Thin Solid Films, 722: 138574. doi:10.1016/j.tsf.2021.138574.

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1-s2.0-S0040609021000572-main.pdf (Publisher version), 6MB
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2021
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 Creators:
Frank, Anna1, Author              
Dias, Miguel2, Author              
Hieke, Stefan Werner1, Author              
Kruth, Angela3, Author              
Scheu, Christina1, 4, Author              
Affiliations:
1Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_2054294              
2INP Greifswald – Leibniz Institute for Plasma Science and Technology, 17489 Greifswald, Germany, ou_persistent22              
3Leibniz Institute for Plasma Science and Technology, 17489 Greifswald, Germany, ou_persistent22              
4Materials Analytics, RWTH Aachen University, Kopernikusstrasse 10, Aachen, Germany, ou_persistent22              

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Language(s): eng - English
 Dates: 2021-02-072021-03-31
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: DOI: 10.1016/j.tsf.2021.138574
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Title: Thin Solid Films
  Abbreviation : Thin Solid Films
Source Genre: Journal
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Pages: 9 Volume / Issue: 722 Sequence Number: 138574 Start / End Page: - Identifier: ISSN: 0040-6090
CoNE: https://pure.mpg.de/cone/journals/resource/954925449792