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  Structure and electronic properties of ultrathin oxide films on metallic substrates

Kuhlenbeck, H., & Freund, H.-J. (1997). Structure and electronic properties of ultrathin oxide films on metallic substrates. In D. A. King, & D. P. Woodruff (Eds.), Growth and Properties of Ultrathin Epitaxial Layers (pp. 340-374). Amsterdam: Elsevier.

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 Creators:
Kuhlenbeck, Helmut1, Author           
Freund, Hans-Joachim1, Author           
Affiliations:
1Chemical Physics, Fritz Haber Institute, Max Planck Society, ou_24022              

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 Abstract: This chapter will deal with the properties of ultrathin oxide layers on different substrates. We will discuss different modes of preparation, the surface geometry of the respective oxide films and their electronic properties. The focus will be put onto the systems NiO(100)/Ni(100), NiO(111)/Ni(111), Cr2O3(0001)/Cr(110) and Al2O3(111)/NiAl(110), that are prepared by oxidation of metal or alloy single crystals in an oxygen atmosphere at elevated temperature. We will also discuss systems where the oxide film is prepared by oxidation of a metal which is evaporated onto an inert substrate.

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Language(s): eng - English
 Dates: 1997
 Publication Status: Issued
 Pages: 35
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1016/S1571-0785(97)80012-0
 Degree: -

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Title: Growth and Properties of Ultrathin Epitaxial Layers
Source Genre: Book
 Creator(s):
King, D. A., Editor
Woodruff, D. P., Editor
Affiliations:
-
Publ. Info: Amsterdam : Elsevier
Pages: 35 Volume / Issue: - Sequence Number: - Start / End Page: 340 - 374 Identifier: ISBN: 978-0-444-82768-5

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Title: The Chemical Physics of Solid Surfaces
Source Genre: Series
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Publ. Info: -
Pages: - Volume / Issue: 8 Sequence Number: - Start / End Page: - Identifier: ISSN: 1571-0785