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  Influence of substrates and e-beam evaporation parameters on the microstructure of nanocrystalline and epitaxially grown Ti thin films

Devulapalli, V., Bishara, H., Ghidelli, M., Dehm, G., & Liebscher, C. (2021). Influence of substrates and e-beam evaporation parameters on the microstructure of nanocrystalline and epitaxially grown Ti thin films. Applied Surface Science, 562: 150194. doi:10.1016/j.apsusc.2021.150194.

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 Creators:
Devulapalli, Vivek1, Author           
Bishara, Hanna2, Author           
Ghidelli, Matteo2, 3, Author           
Dehm, Gerhard4, Author           
Liebscher, Christian1, Author           
Affiliations:
1Advanced Transmission Electron Microscopy, Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863399              
2Thin Films and Nanostructured Materials, Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_3274276              
3Laboratoire des Sciences des Procédés et des Matériaux (LSPM), CNRS, Université Sorbonne Paris Nord, 93430 Villetaneuse, France, ou_persistent22              
4Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863398              

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Language(s): eng - English
 Dates: 2021-05-262021-10-01
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: DOI: 10.1016/j.apsusc.2021.150194
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Title: Applied Surface Science
  Abbreviation : Appl. Surf. Sci.
Source Genre: Journal
 Creator(s):
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Publ. Info: -
Pages: - Volume / Issue: 562 Sequence Number: 150194 Start / End Page: - Identifier: ISSN: 0169-4332
CoNE: https://pure.mpg.de/cone/journals/resource/954928576736