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  Analysis and Interpretation of Scanning Tunneling Microscopy Images in an Electrochemical Environment: Copper on AU(111)

Haiss, W., Sass, J.-K., Lackey, D., & Heel, M. v. (1994). Analysis and Interpretation of Scanning Tunneling Microscopy Images in an Electrochemical Environment: Copper on AU(111). In S. H. Cohen (Ed.), Atomic Force Microscopy/Scanning Tunneling Microscopy (pp. 423-435). Boston: Springer.

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 Urheber:
Haiss, Wolfgang1, Autor           
Sass, Jürgen-Kurt1, Autor           
Lackey, Damian1, Autor           
Heel, Marin van1, Autor           
Affiliations:
1Fritz Haber Institute, Max Planck Society, ou_24021              

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 Zusammenfassung: The electrochemical deposition of a copper monolayer on Au(111) has been studied by STM in H2SO and Na2SO4 solutions. Three different superstructures, which are attributed to the adsorption of either HSO , SO 4 2− or both anions, have been observed for the full monolayer. Evidence for the expected epitaxial (1 × 1) overlayer was also obtained at very negative potentials, by avoiding bulk copper growth. A novel STM data analysis by multivariate statistical procedures is shown to provide detailed information, which is not evident in the raw data. The need for a better understanding of the tunneling and imaging mechanisms in an electrochemical environment is emphasized.

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Sprache(n): eng - English
 Datum: 1994
 Publikationsstatus: Erschienen
 Seiten: 15
 Ort, Verlag, Ausgabe: -
 Inhaltsverzeichnis: -
 Art der Begutachtung: Expertenbegutachtung
 Identifikatoren: DOI: 10.1007/978-1-4757-9322-2_42
 Art des Abschluß: -

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Titel: Atomic Force Microscopy/Scanning Tunneling Microscopy
Genre der Quelle: Buch
 Urheber:
Cohen, Samuel H.1, Herausgeber
Bray, Mona T., Autor
Lightbody, Marcia L., Autor
Affiliations:
1 Development and Engineering CenterU.S. Army Natick Research, Natick, USA, ou_persistent22            
Ort, Verlag, Ausgabe: Boston : Springer
Seiten: 15 Band / Heft: - Artikelnummer: - Start- / Endseite: 423 - 435 Identifikator: ISBN: 978-1-4757-9324-6