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  Optical properties of ultrarough silver films on silicon

Neff, H., Henkel, S., Sass, J.-K., Steinbeiss, E., Ratz, P., Müller, J., et al. (1996). Optical properties of ultrarough silver films on silicon. Journal of Applied Physics, 80(2), 1058-1063. doi:10.1063/1.362841.

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1.362841.pdf (Publisher version), 4MB
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1.362841.pdf
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1996
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AIP
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 Creators:
Neff, H.1, Author
Henkel, S.2, Author
Sass, Jürgen-Kurt3, Author           
Steinbeiss, E.4, Author
Ratz, P.4, Author
Müller, J.4, Author
Michalke, W.4, Author
Affiliations:
1TZN Forschungs‐und Entwicklungszentrum Unterlüss GmbH, Neuensothriether Strasse 20, D‐29345 Unterlüss, Germany, ou_persistent22              
21. Physikalisches Institut der RWTH Aachen, D‐52056 Aachen, Germany, ou_persistent22              
3Fritz Haber Institute, Max Planck Society, ou_24021              
4Institut für Physikalische Hochtechnologie (IPHT), Helmholtzweg 4, D‐007743 Jena, Germany, ou_persistent22              

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 Abstract: The optical properties of inhomogeneously grown rough silver films have been analyzed on the basis of reflectance measurements. Data have been recorded within the wave number range 50 cm−1 < λ−1 <50 000 cm−1. The results are compared with compact and fairly smooth films, made from the same metal. Rough films reveal very low reflectance and high absorptivity values of nearly 1, at wave numbers ≳200 cm−1. The reflectance of these films is peaking at the bulk plasma resonance hvp of silver at 3.87 eV. Smooth compact films, in contrast, show a pronounced minimum at the same energy. Based on an effective medium approach and available literature data, the dielectric function (DF) and absorption coefficient have been calculated. For rough films, the real part of the DF remains positive within the whole spectral range, but is negative for compact films below hvp, in agreement with published data. The calculated DF of the inhomogeneously grown films fully resembles the experimental observations.

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Language(s): eng - English
 Dates: 1996-01-081996-04-161996
 Publication Status: Issued
 Pages: 5
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1063/1.362841
 Degree: -

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Title: Journal of Applied Physics
  Abbreviation : J. Appl. Phys.
Source Genre: Journal
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Publ. Info: New York, NY : AIP Publishing
Pages: 5 Volume / Issue: 80 (2) Sequence Number: - Start / End Page: 1058 - 1063 Identifier: ISSN: 0021-8979
CoNE: https://pure.mpg.de/cone/journals/resource/991042723401880