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  Valence band offset in ZnS layers on Si(111) grown by molecular beam epitaxy

Maierhofer, C., Kulkarni, S., Alonso, M., Reich, T., & Horn, K. (1991). Valence band offset in ZnS layers on Si(111) grown by molecular beam epitaxy. Journal of Vacuum Science and Technology B, 9(4), 2238-2243. doi:10.1116/1.585727.

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1.585727.pdf (Publisher version), 714KB
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1.585727.pdf
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1991
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AIP
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 Creators:
Maierhofer, Christiane1, Author           
Kulkarni, S.1, Author           
Alonso, Maria1, Author           
Reich, T.1, Author           
Horn, Karsten1, Author           
Affiliations:
1Fritz Haber Institute, Max Planck Society, ou_24021              

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 Abstract: The heterojunction between silicon(111) and zinc sulfide was studied using Auger electron spectroscopy, photoelectron spectroscopy, and low‐energy electron diffraction. Zinc sulfide layers were deposited onto cleaved Si(111) surfaces as well as Si(111)‐(7×7) wafers by molecular beam epitaxy. The overlayers exhibited fair crystalline quality, and the characteristic valence‐band spectrum of ZnS. The valence‐band offset between the two semiconductors was determined from the core and valence‐band spectra (ΔEv=−0.7 eV) and found to be much smaller than predicted. We attribute this disagreement, and the larger than usual scatter in our data, to the influence of interface dipoles in this polar interface, the density of which may partly be influenced by a varying amount of interface reaction.

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Language(s): eng - English
 Dates: 1991-01-291991-04-151991-07
 Publication Status: Issued
 Pages: 6
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1116/1.585727
 Degree: -

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Title: Journal of Vacuum Science and Technology B
  Other : J. Vac. Sci. Techn. B
  Other : JVST B
Source Genre: Journal
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Publ. Info: New York : Published by AVS through the American Institute of Physics
Pages: 6 Volume / Issue: 9 (4) Sequence Number: - Start / End Page: 2238 - 2243 Identifier: ISSN: 0734-2101
CoNE: https://pure.mpg.de/cone/journals/resource/954928495416