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  Shape control in wafer-based aperiodic 3D nanostructures

Hyeon-Ho, J., Mark, A. G., Gibbs, J. G., Reindl, T., Waizmann, U., Weis, J., et al. (2014). Shape control in wafer-based aperiodic 3D nanostructures. Nanotechnology, 25(23): 235302, pp. 1-8. doi:10.1088/0957-4484/25/23/235302.

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 Creators:
Hyeon-Ho, Jeong, Author
Mark, Andrew G., Author
Gibbs, John G., Author
Reindl, Thomas, Author
Waizmann, Ulrike, Author
Weis, Juergen, Author
Fischer, Peer1, Author           
Affiliations:
1Optical Nanoscopy, Max Planck Institute for Medical Research, Max Planck Society, ou_2364730              

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Free keywords: 3D nanofabrication, glancing angle deposition, electron beam lithography, shadow growth, physical vapour deposition
 Abstract: Controlled local fabrication of three-dimensional (3D) nanostructures is important to explore and enhance the function of single nanodevices, but is experimentally challenging. We present a scheme based on e-beam lithography (EBL) written seeds, and glancing angle deposition (GLAD) grown structures to create nanoscale objects with defined shapes but in aperiodic arrangements. By using a continuous sacrificial corral surrounding the features of interest we grow isolated 3D nanostructures that have complex cross-sections and sidewall morphology that are surrounded by zones of clean substrate.

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Language(s): eng - English
 Dates: 2014-03-242014-01-222014-03-242014-05-212014-06-13
 Publication Status: Issued
 Pages: 8
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1088/0957-4484/25/23/235302
BibTex Citekey: ISI:000336958900005
URI: https://pubmed.ncbi.nlm.nih.gov/24850063/
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Title: Nanotechnology
  Abbreviation : Nanotechnology
Source Genre: Journal
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Publ. Info: Bristol, UK : IOP Pub.
Pages: - Volume / Issue: 25 (23) Sequence Number: 235302 Start / End Page: 1 - 8 Identifier: ISSN: 0957-4484
CoNE: https://pure.mpg.de/cone/journals/resource/954925577042