English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT
 
 
DownloadE-Mail
  Control of bonding and epitaxy at copper/sapphire interface

Oh, S. H., Scheu, C., Wagner, T., & Rühle, M. (2007). Control of bonding and epitaxy at copper/sapphire interface. Applied Physics Letters, 91(14): 141912.

Item is

Files

show Files

Locators

show

Creators

show
hide
 Creators:
Oh, S. H., Author
Scheu, C., Author
Wagner, T.1, Author           
Rühle, M., Author
Affiliations:
1Miscellaneous, Max Planck Institute for Solid State Research, Max Planck Society, ou_3370507              

Content

show
hide
Free keywords: -
 Abstract: The nature of bonding evolving at a metal/oxide interface depends strongly on the termination of oxide surface stabilized in the bonding environment. Specific surface treatments in ultrahigh vacuum allow control of the termination of sapphire (alpha-Al2O3) (0001) surface varying from hydroxyl-terminated to aluminum-terminated to oxygen-terminated surfaces. With this capability, the interfacial bonding forming between epitaxial Cu films and sapphire (0001) substrates can be tailored. Transmission electron microscopy studies reveal that the interatomic interaction at the interface plays a decisive role in determining wetting, orientation relationship, and thermal behavior of Cu thin films. (C) 2007 American Institute of Physics.

Details

show
hide
Language(s): eng - English
 Dates: 2007
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 338815
ISI: 000249974100037
 Degree: -

Event

show

Legal Case

show

Project information

show

Source 1

show
hide
Title: Applied Physics Letters
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 91 (14) Sequence Number: 141912 Start / End Page: - Identifier: ISSN: 0003-6951