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  Investigating the lateral motion of SiGe islands by selective chemical etching

Katsaros, G., Rastelli, A., Stoffel, M., Isella, G., von Känel, H., Bittner, A. M., et al. (2006). Investigating the lateral motion of SiGe islands by selective chemical etching. Surface Science, 600, 2608-2613.

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 Creators:
Katsaros, G.1, Author           
Rastelli, A.1, 2, Author           
Stoffel, M.1, Author           
Isella, G., Author
von Känel, H., Author
Bittner, A. M.1, Author           
Tersoff, J., Author
Denker, U.1, 2, 3, Author           
Schmidt, O. G.1, 2, 3, 4, Author           
Costantini, G.1, Author           
Kern, K.1, Author           
Affiliations:
1Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370481              
2Former Scientific Facilities, Max Planck Institute for Solid State Research, Max Planck Society, ou_3370501              
3Abteilung v. Klitzing, Former Departments, Max Planck Institute for Solid State Research, Max Planck Society, ou_3370504              
4Scientific Facility Nanostructuring Lab (Jürgen Weis), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370499              

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 Dates: 2006
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 286851
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Title: Surface Science
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 600 Sequence Number: - Start / End Page: 2608 - 2613 Identifier: -