Thin manganese films on Si(111)-(7x7): electronic structure and strain in 
silicide formation

Kumar, A.; Tallarida, M.; Hansmann, M.; Starke, U.; Horn, K.

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Thin manganese films on Si(111)-(7x7): electronic structure and strain in silicide formation

Kumar, A., Tallarida, M., Hansmann, M., Starke, U., & Horn, K. (2004). Thin manganese films on Si(111)-(7x7): electronic structure and strain in silicide formation. Journal of Physics D, 37, 1083-1090.

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Item Permalink: https://hdl.handle.net/21.11116/0000-000E-F5DF-3 Version Permalink: https://hdl.handle.net/21.11116/0000-000E-F5E0-0

Genre: Journal Article

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Creators:
Kumar, A.^{1, 2}, Author
Tallarida, M., Author
Hansmann, M., Author
Starke, U.³, Author
Horn, K., Author

Affiliations:
1Department Solid State Spectroscopy (Bernhard Keimer), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370480
2Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370481
3Scientific Facility Interface Analysis (Ulrich Starke), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370498

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Language(s): eng - English

Dates: Date issued: 2004

Publication Status: Issued

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Identifiers: eDoc: 199168

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Title: Journal of Physics D

Source Genre: Journal

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Pages: - Volume / Issue: 37 Sequence Number: - Start / End Page: 1083 - 1090 Identifier: -