Structure refinement, physical properties and electronic structure of new 
electrochemically copper intercalated group Vb ditellurides CuxMTe2 (M = V, Nb, 
Ta)

Sörgel, T.; Jansen, M.

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Structure refinement, physical properties and electronic structure of new electrochemically copper intercalated group Vb ditellurides Cu_xMTe₂ (M = V, Nb, Ta)

Sörgel, T., & Jansen, M. (2004). Structure refinement, physical properties and electronic structure of new electrochemically copper intercalated group Vb ditellurides Cu_xMTe₂ (M = V, Nb, Ta). Solid State Sciences, 6(11), 1259-1267.

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Item Permalink: https://hdl.handle.net/21.11116/0000-000E-F8A7-E Version Permalink: https://hdl.handle.net/21.11116/0000-000E-F8A8-D

Genre: Journal Article

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Creators:
Sörgel, T.¹, Author
Jansen, M.¹, Author

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1Abteilung Jansen, Former Departments, Max Planck Institute for Solid State Research, Max Planck Society, ou_3370503

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Free keywords: layer compounds; copper vanadium telluride; copper niobium telluride; copper tantalum telluride; copper intercalation; short Cu-Cu distances; TB-LMTO-ASA

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Language(s): eng - English

Dates: Date issued: 2004

Publication Status: Issued

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Identifiers: eDoc: 217191
ISI: 000225527700011

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Title: Solid State Sciences

Source Genre: Journal

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Pages: - Volume / Issue: 6 (11) Sequence Number: - Start / End Page: 1259 - 1267 Identifier: ISSN: 1293-2558