Chemical imaging of interfaces by sum-frequency generation microscopy: 
Application to patterned self-assembled monolayers

Kuhnke, K.; Hoffmann, D. M. P.; Wu, X. C.; Bittner, A. M.; Kern, K.

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Chemical imaging of interfaces by sum-frequency generation microscopy: Application to patterned self-assembled monolayers

Kuhnke, K., Hoffmann, D. M. P., Wu, X. C., Bittner, A. M., & Kern, K. (2003). Chemical imaging of interfaces by sum-frequency generation microscopy: Application to patterned self-assembled monolayers. Applied Physics Letters, 83(18), 3830-3832.

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Item Permalink: https://hdl.handle.net/21.11116/0000-000E-E5AD-D Version Permalink: https://hdl.handle.net/21.11116/0000-000E-E5AE-C

Genre: Journal Article

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Creators:
Kuhnke, K.¹, Author
Hoffmann, D. M. P.¹, Author
Wu, X. C.¹, Author
Bittner, A. M.¹, Author
Kern, K.¹, Author

Affiliations:
1Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370481

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Language(s): eng - English

Dates: Date issued: 2003

Publication Status: Issued

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Identifiers: eDoc: 64901
ISI: 000186256300062

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Title: Applied Physics Letters

Source Genre: Journal

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Pages: - Volume / Issue: 83 (18) Sequence Number: - Start / End Page: 3830 - 3832 Identifier: ISSN: 0003-6951