Scanning tunneling microscopy and x-ray photoelectron diffraction investigation 
of C60 films on Cu(100)

Abel, M.; Dmitriev, A.; Fasel, R.; Lin, N.; Barth, J. V.; Kern, K.

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Scanning tunneling microscopy and x-ray photoelectron diffraction investigation of C₆₀ films on Cu(100)

Abel, M., Dmitriev, A., Fasel, R., Lin, N., Barth, J. V., & Kern, K. (2003). Scanning tunneling microscopy and x-ray photoelectron diffraction investigation of C₆₀ films on Cu(100). Physical Review B, 67(24): 245407.

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Item Permalink: https://hdl.handle.net/21.11116/0000-000E-F147-2 Version Permalink: https://hdl.handle.net/21.11116/0000-000E-F148-1

Genre: Journal Article

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Creators:
Abel, M.¹, Author
Dmitriev, A.¹, Author
Fasel, R., Author
Lin, N.¹, Author
Barth, J. V.^{1, 2}, Author
Kern, K.¹, Author

Affiliations:
1Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370481
2Former Research Groups, Max Planck Institute for Solid State Research, Max Planck Society, ou_3370500

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Language(s): eng - English

Dates: Date issued: 2003

Publication Status: Issued

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Identifiers: eDoc: 64781
ISI: 000184186600060

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Title: Physical Review B

Source Genre: Journal

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Pages: - Volume / Issue: 67 (24) Sequence Number: 245407 Start / End Page: - Identifier: ISSN: 1098-0121