Intrinsic Josephson junction fabricated in a well-controlled way

You, L. X.; Wu, P. H.; Fan, S. X.; Xu, W. W.; Kang, L.; Lin, C. T.; Liang, B.

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Intrinsic Josephson junction fabricated in a well-controlled way

You, L. X., Wu, P. H., Fan, S. X., Xu, W. W., Kang, L., Lin, C. T., et al. (2003). Intrinsic Josephson junction fabricated in a well-controlled way. Semiconductor Science and Technology, 16, 1361-1364.

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Item Permalink: https://hdl.handle.net/21.11116/0000-000E-E1E7-F Version Permalink: https://hdl.handle.net/21.11116/0000-000E-E1E8-E

Genre: Journal Article

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Creators:
You, L. X., Author
Wu, P. H., Author
Fan, S. X., Author
Xu, W. W., Author
Kang, L., Author
Lin, C. T.¹, Author
Liang, B.^{1, 2}, Author

Affiliations:
1Scientific Facility Crystal Growth (Masahiko Isobe), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370496
2Department Solid State Spectroscopy (Bernhard Keimer), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370480

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Language(s): eng - English

Dates: Date issued: 2003

Publication Status: Issued

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Identifiers: eDoc: 124420

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Title: Semiconductor Science and Technology

Source Genre: Journal

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Pages: - Volume / Issue: 16 Sequence Number: - Start / End Page: 1361 - 1364 Identifier: -