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  Physics and application potential of epitaxial strain in doped rare earth manganites

Habermeier, H.-U. (2002). Physics and application potential of epitaxial strain in doped rare earth manganites. Physica B, 321(1-4), 9-17.

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 Creators:
Habermeier, H.-U.1, 2, 3, Author           
Affiliations:
1Scientific Facility Thin Film Technology (Gennady Logvenov), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370497              
2Department Solid State Spectroscopy (Bernhard Keimer), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370480              
3Department Physical Chemistry of Solids (Joachim Maier), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370483              

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Free keywords: CMR thin films; epitaxial growth; pulsed laser deposition
 Abstract: Doped manganese oxides represent a class of materials with a
wealth of ordering phenomena including spin-, charge- and
orbital ordering, all coupled to lattice properties. The
possibility to grow epitaxial thin films paves the way to
introduce controllable epitaxial strain and to artificially
modify the film properties. In three examples this is
demonstrated and discussed in the paper. First, tailoring the
ferromagnetic ordering temperature and the characteristics of
the magnetization curve in La2/3Ca1/3MnO3 thin films, second,
the pressure sensitivity of resistivity in strained
La2/3Ca1/3MnO3 thin films. Finally, using films grown on
vicinal cut substrates, anisotropic properties of strained
films are studied and thermoelectric voltages can be measured.
These examples pave the way to new types of applications of
colossal magnetoresistance thin films beyond spintronics. (C)
2002 Elsevier Science B.V. All rights reserved.

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Language(s): eng - English
 Dates: 2002
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 7168
ISI: 000178070400003
 Degree: -

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Title: Physica B
Source Genre: Journal
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Pages: - Volume / Issue: 321 (1-4) Sequence Number: - Start / End Page: 9 - 17 Identifier: ISSN: 0921-4526