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  In situ etching with AsBr3 and regrowth in molecular beam epitaxy

Schuler, H., Kaneko, T., Lipinski, M., & Eberl, K. (2000). In situ etching with AsBr3 and regrowth in molecular beam epitaxy. Semiconductor Science and Technology, 15, 169-177.

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 Creators:
Schuler, H., Author
Kaneko, T., Author
Lipinski, M.1, Author           
Eberl, K.1, Author           
Affiliations:
1Former Scientific Facilities, Max Planck Institute for Solid State Research, Max Planck Society, ou_3370501              

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 Dates: 2000
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 181859
Other: 27460
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Title: Semiconductor Science and Technology
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 15 Sequence Number: - Start / End Page: 169 - 177 Identifier: -