Physics and applications of Si/SiGe/Si resonant interband tunneling diodes

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Physics and applications of Si/SiGe/Si resonant interband tunneling diodes

Duschl, R., & Eberl, K. (2000). Physics and applications of Si/SiGe/Si resonant interband tunneling diodes. Thin Solid Films, 380, 151-153.

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Item Permalink: https://hdl.handle.net/21.11116/0000-000E-EA71-B Version Permalink: https://hdl.handle.net/21.11116/0000-000E-EA72-A

Genre: Journal Article

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Creators:
Duschl, R.¹, Author
Eberl, K.¹, Author

Affiliations:
1Former Scientific Facilities, Max Planck Institute for Solid State Research, Max Planck Society, ou_3370501

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Dates: Date issued: 2000

Publication Status: Issued

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Identifiers: eDoc: 181432
Other: 27007

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Title: Thin Solid Films

Source Genre: Journal

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Pages: - Volume / Issue: 380 Sequence Number: - Start / End Page: 151 - 153 Identifier: -