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  Shadow evaporation method for fabrication of sub 10 nm gaps between metal electrodes.

Philipp, G., Weimann, T., Hinze, P., Burghard, M., & Weis, J. (1999). Shadow evaporation method for fabrication of sub 10 nm gaps between metal electrodes. Microelectronic Engineering, 46, 157-160.

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 Creators:
Philipp, G.1, Author           
Weimann, T., Author
Hinze, P., Author
Burghard, M.2, Author           
Weis, J.1, 3, Author           
Affiliations:
1Abteilung v. Klitzing, Former Departments, Max Planck Institute for Solid State Research, Max Planck Society, ou_3370504              
2Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370481              
3Scientific Facility Nanostructuring Lab (Jürgen Weis), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370499              

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 Dates: 1999
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 181043
Other: 15823
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Title: Microelectronic Engineering
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 46 Sequence Number: - Start / End Page: 157 - 160 Identifier: -