Shadow evaporation method for fabrication of sub 10 nm gaps between metal 
electrodes.

Philipp, G.; Weimann, T.; Hinze, P.; Burghard, M.; Weis, J.

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Shadow evaporation method for fabrication of sub 10 nm gaps between metal electrodes.

Philipp, G., Weimann, T., Hinze, P., Burghard, M., & Weis, J. (1999). Shadow evaporation method for fabrication of sub 10 nm gaps between metal electrodes. Microelectronic Engineering, 46, 157-160.

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Item Permalink: https://hdl.handle.net/21.11116/0000-000E-DDFC-E Version Permalink: https://hdl.handle.net/21.11116/0000-000E-DDFD-D

Genre: Journal Article

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Creators:
Philipp, G.¹, Author
Weimann, T., Author
Hinze, P., Author
Burghard, M.², Author
Weis, J.^{1, 3}, Author

Affiliations:
1Abteilung v. Klitzing, Former Departments, Max Planck Institute for Solid State Research, Max Planck Society, ou_3370504
2Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370481
3Scientific Facility Nanostructuring Lab (Jürgen Weis), Max Planck Institute for Solid State Research, Max Planck Society, ou_3370499

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Dates: Date issued: 1999

Publication Status: Issued

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Identifiers: eDoc: 181043
Other: 15823

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Title: Microelectronic Engineering

Source Genre: Journal

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Pages: - Volume / Issue: 46 Sequence Number: - Start / End Page: 157 - 160 Identifier: -