Formation of polycrystalline Si with log-normal grain size distribution.

Bergmann, R. B.; Shi, F. G.; Queisser, H.-J.; Krinke, J.

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Formation of polycrystalline Si with log-normal grain size distribution.

Bergmann, R. B., Shi, F. G., Queisser, H.-J., & Krinke, J. (1998). Formation of polycrystalline Si with log-normal grain size distribution. Applied Surface Science, 123-124, 376-380.

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Item Permalink: https://hdl.handle.net/21.11116/0000-000E-D688-7 Version Permalink: https://hdl.handle.net/21.11116/0000-000E-D689-6

Genre: Journal Article

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Creators:
Bergmann, R. B.¹, Author
Shi, F. G., Author
Queisser, H.-J.¹, Author
Krinke, J., Author

Affiliations:
1Former Departments, Max Planck Institute for Solid State Research, Max Planck Society, ou_3370502

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Dates: Date issued: 1998

Publication Status: Issued

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Identifiers: eDoc: 182872
Other: 4269

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Title: Applied Surface Science

Source Genre: Journal

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Pages: - Volume / Issue: 123-124 Sequence Number: - Start / End Page: 376 - 380 Identifier: -