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  Defect-induced magnetism in homoepitaxial SrTiO3

Rata, A. D., Herrero-Martin, J., Maznichenko V, I., Chiabrera, F. M., Dahm, R. T., Ostanin, S., et al. (2022). Defect-induced magnetism in homoepitaxial SrTiO3. APL Materials, 10(9): 091108. doi:10.1063/5.0101411.

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5.0101411.pdf (Verlagsversion), 9MB
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https://doi.org/10.1063/5.0101411 (Verlagsversion)
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 Urheber:
Rata, A. D.1, Autor
Herrero-Martin, J.1, Autor
Maznichenko V, I.1, Autor
Chiabrera, F. M.1, Autor
Dahm, R. T.1, Autor
Ostanin, S.1, Autor
Lee, D.1, Autor
Jalan, B.1, Autor
Buczek, P.1, Autor
Mertig, I1, Autor
Ernst, A.2, Autor                 
Ionescu, A. M.1, Autor
Doerr, K.1, Autor
Pryds, N.1, Autor
Park, D-S1, Autor
Affiliations:
1external, ou_persistent22              
2Nano-Systems from Ions, Spins and Electrons, Max Planck Institute of Microstructure Physics, Max Planck Society, ou_3287476              

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 Zusammenfassung: Along with recent advancements in thin-film technologies, the engineering of complex transition metal oxide heterostructures offers the possibility of creating novel and tunable multifunctionalities. A representative complex oxide is the perovskite strontium titanate (STO), whose bulk form is nominally a centrosymmetric paraelectric band insulator. By tuning the electron doping, chemical stoichiometry, strain, and charge defects of STO, it is possible to control the electrical, magnetic, and thermal properties of such structures. Here, we demonstrate tunable magnetism in atomically engineered STO thin films grown on STO (001) substrates by controlling the atomic charge defects of titanium (VTi) and oxygen (VO) vacancies. Our results show that the magnetism can be tuned by altering the growth conditions. We provide deep insights into its association to the following defect types: (i) VTi, resulting in a charge rearrangement and local spin polarization, (ii) VO, leading to weak magnetization, and (iii) VTi–VO pairs, which lead to the appearance of a sizable magnetic signal. Our results suggest that controlling charged defects is critical for inducing a net magnetization in STO films. This work provides a crucial step for designing magnetic STO films via defect engineering for magnetic and spin-based electronic applications.

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 Datum: 2022-09-20
 Publikationsstatus: Online veröffentlicht
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 Identifikatoren: ISI: 000876213200002
DOI: 10.1063/5.0101411
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Titel: APL Materials
  Kurztitel : APL Mater.
Genre der Quelle: Zeitschrift
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Affiliations:
Ort, Verlag, Ausgabe: AIP Scitation
Seiten: - Band / Heft: 10 (9) Artikelnummer: 091108 Start- / Endseite: - Identifikator: CoNE: https://pure.mpg.de/cone/journals/resource/2166-532X