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  Improving OFF‐State Bias‐Stress Stability in High‐Mobility Conjugated Polymer Transistors with an Antisolvent Treatment

Nguyen, M., Kraft, U., Tan, W. L., Dobryden, I., Broch, K., Zhang, W., et al. (2023). Improving OFF‐State Bias‐Stress Stability in High‐Mobility Conjugated Polymer Transistors with an Antisolvent Treatment. Advanced Materials, 35(16): 2205377. doi:10.1002/adma.202205377.

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Advanced Materials - 2022 - Nguyen - Improving OFF‐State Bias‐Stress Stability in High‐Mobility Conjugated Polymer.pdf (Publisher version), 6MB
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Advanced Materials - 2022 - Nguyen - Improving OFF‐State Bias‐Stress Stability in High‐Mobility Conjugated Polymer.pdf
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2023
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 Creators:
Nguyen, Malgorzata, Author
Kraft, Ulrike1, Author           
Tan, Wen Liang, Author
Dobryden, Illia, Author
Broch, Katharina, Author
Zhang, Weimin, Author
Un, Hio‐Ieng, Author
Simatos, Dimitrios, Author
Venkateshavaran, Deepak, Author
McCulloch, Iain, Author
Claesson, Per M., Author
McNeill, Christopher R., Author
Sirringhaus, Henning, Author
Affiliations:
1Dept. Blom: Molecular Electronics, MPI for Polymer Research, Max Planck Society, ou_1800284              

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Language(s): eng - English
 Dates: 2022-11-142023-04-20
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: -
 Identifiers: DOI: 10.1002/adma.202205377
 Degree: -

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Title: Advanced Materials
  Other : Adv. Mater.
Source Genre: Journal
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Publ. Info: Weinheim : Wiley-VCH
Pages: - Volume / Issue: 35 (16) Sequence Number: 2205377 Start / End Page: - Identifier: ISSN: 0935-9648
CoNE: https://pure.mpg.de/cone/journals/resource/954925570855