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  Dynamic character of compositional sputter depth profiling by SIMS: A comparison of different models for quantitative profile evaluation

Hofmann, S., Zhong, F.-M., Yang, H., Wang, J.-Y., & Xu, C.-K. (2023). Dynamic character of compositional sputter depth profiling by SIMS: A comparison of different models for quantitative profile evaluation. Journal of Vacuum Science and Technology. A, 41(1): 013408. doi:10.1116/6.0002233.

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Item Permalink: https://hdl.handle.net/21.11116/0000-000C-BD9E-E Version Permalink: https://hdl.handle.net/21.11116/0000-000C-BD9F-D
Genre: Journal Article

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https://doi.org/10.1116/6.0002233 (Publisher version)
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 Creators:
Hofmann, Siegfried1, 2, Author           
Zhong, Feng-Min1, Author
Yang, Hao1, Author
Wang, Jiang-Yong1, 3, Author
Xu, Cong-Kang1, 3, Author
Affiliations:
1Department of Physics, Shantou University, 243 Daxue Road, Shantou 515063, Guangdong, China, ou_persistent22              
2Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497650              
3Center of Semiconductor Materials and Devices, Shantou University, 243 Daxue Road, Shantou 515063, Guangdong, China, ou_persistent22              

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Free keywords: Emeriti and Others
 Abstract: -

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Language(s): eng - English
 Dates: 2023-01-042023-01
 Publication Status: Issued
 Pages: 6
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1116/6.0002233
 Degree: -

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Title: Journal of Vacuum Science and Technology. A
Source Genre: Journal
 Creator(s):
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Publ. Info: New York : Published by AVS through the American Institute of Physics
Pages: - Volume / Issue: 41 (1) Sequence Number: 013408 Start / End Page: - Identifier: ISSN: 0734-2101
CoNE: https://pure.mpg.de/cone/journals/resource/954928495416_1