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  Operando Characterization and Molecular Simulations Reveal the Growth Kinetics of Graphene on Liquid Copper During Chemical Vapor Deposition

Rein, V., Gao, H., Heenen, H., Sghaier, W., Manikas, A. C., Tsakonas, C., et al. (2024). Operando Characterization and Molecular Simulations Reveal the Growth Kinetics of Graphene on Liquid Copper During Chemical Vapor Deposition. ACS Nano, 18(19), 12503-12511. doi:10.1021/acsnano.4c02070.

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2305.18331.pdf (Preprint), 2MB
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2305.18331.pdf
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arXiv:2305.18331v4
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2024
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 Creators:
Rein, Valentina, Author
Gao, Hao1, Author                 
Heenen, Hendrik1, Author                 
Sghaier, Wissal, Author
Manikas, Anastasios C., Author
Tsakonas, Christos, Author
Saedi, Mehdi, Author
Margraf, Johannes1, Author                 
Galiotis, Costas, Author
Renaud, Gilles, Author
Konovalov, Oleg V., Author
Groot, Irene M. N., Author
Reuter, Karsten1, Author                 
Jankowski, Maciej, Author
Affiliations:
1Theory, Fritz Haber Institute, Max Planck Society, ou_634547              

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Free keywords: Condensed Matter, Materials Science, cond-mat.mtrl-sci, Physics, Chemical Physics, physics.chem-ph
 Abstract: In recent years, liquid metal catalysts have emerged as a compelling choice for the controllable, large-scale, and high-quality synthesis of two-dimensional materials. At present, there is little mechanistic understanding of the intricate catalytic process, though, of its governing factors or what renders it superior to growth at the corresponding solid catalysts. Here, we report on a combined experimental and computational study of the kinetics of graphene growth during chemical vapor deposition on a liquid copper catalyst. By monitoring the growing graphene flakes in real time using in situ radiation-mode optical microscopy, we explore the growth morphology and kinetics over a wide range of CH4-to-H2 pressure ratios and deposition temperatures. Constant growth rates of the flakes’ radius indicate a growth mode limited by precursor attachment, whereas methane-flux-dependent flake shapes point to limited precursor availability. Large-scale free energy simulations enabled by an efficient machine-learning moment tensor potential trained to density functional theory data provide quantitative barriers for key atomic-scale growth processes. The wealth of experimental and theoretical data can be consistently combined into a microkinetic model that reveals mixed growth kinetics that, in contrast to the situation at solid Cu, is partly controlled by precursor attachment alongside precursor availability. Key mechanistic aspects that directly point toward the improved graphene quality are a largely suppressed carbon dimer attachment due to the facile incorporation of this precursor species into the liquid surface and a low-barrier ring-opening process that self-heals 5-membered rings resulting from remaining dimer attachments.

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Language(s): eng - English
 Dates: 2023-05-242024-03-222024-02-122024-04-012024-04-302024-05-14
 Publication Status: Issued
 Pages: 9
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: arXiv: 2305.18331
DOI: 10.1021/acsnano.4c02070
 Degree: -

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Project name : DirectSepa - Direct Separation of Two-Dimensional Materials from the Surface of Liquid Metal Catalysts
Grant ID : 951943
Funding program : Horizon 2020 (H2020)
Funding organization : European Commission (EC)

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Title: ACS Nano
  Abbreviation : ACS Nano
Source Genre: Journal
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Affiliations:
Publ. Info: Washington, DC : American Chemical Society
Pages: 9 Volume / Issue: 18 (19) Sequence Number: - Start / End Page: 12503 - 12511 Identifier: ISSN: 1936-0851
CoNE: https://pure.mpg.de/cone/journals/resource/1936-0851