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  Realization of chiral multifold semimetal RhSi crystalline thin films

Lv, H., Lesne, E., Ibarra, R., Sun, Y., Markou, A., & Felser, C. (2023). Realization of chiral multifold semimetal RhSi crystalline thin films. Physical Review Materials, 7(5): 054201, pp. 1-6. doi:10.1103/PhysRevMaterials.7.054201.

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 Creators:
Lv, Hua1, Author           
Lesne, Edouard1, Author           
Ibarra, Rebeca1, Author           
Sun, Yan2, Author
Markou, Anastasios1, Author           
Felser, Claudia3, Author           
Affiliations:
1Inorganic Chemistry, Max Planck Institute for Chemical Physics of Solids, Max Planck Society, ou_1863425              
2External Organizations, ou_persistent22              
3Claudia Felser, Inorganic Chemistry, Max Planck Institute for Chemical Physics of Solids, Max Planck Society, ou_1863429              

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Free keywords: Crystal orientation, Crystalline materials, Electric conductivity, Ground state, Metal substrates, Optical properties, Phonons, Silicon compounds, Textures, Thin films, Topology, Crystalline thin films, Electronic and optical properties, Electronic band structure, Magneto transport properties, Magnetron-sputtering, Momentum spaces, Nonmagnetics, Real-space, Si (1 1 1), Stoichiometric compound, Single crystals
 Abstract: Nonmagnetic topological semimetals that combine chirality in real and momentum spaces host unconventional multifold fermions and exhibit exotic electronic and optical properties endowed by their topologically nontrivial electronic band structure. Although the synthesis of nonmagnetic chiral single crystals with a noncentrosymmetric cubic B20 structure is well established, their heteroepitaxial growth in crystalline thin films remains a notable challenge. In this study, we present the structural, magnetic, and electrical magnetotransport properties of 24- and 51-nm-thick films of a B20-RhSi stoichiometric compound grown by magnetron sputtering. RhSi crystalline thin films on Si (111) single-crystal substrates exhibit a preferred (111) orientation with twin domains. The RhSi films display a nonmagnetic ground state, and their electrical resistivity demonstrates a clear and nonsaturating metallic behavior from 300 to 5 K. Magnetotransport measurements reveal that hole-type carriers dominate the Hall response with multiband contributions to electronic transport in the system. The good agreement with the Bloch-Grüneisen model and our first-principles calculations confirms that temperature-dependent electrical resistivity is governed by electron-phonon scattering. The ability to grow textured-epitaxial thin films of nonmagnetic B20 chiral topological semimetals is an important step toward accessing and controlling their remarkable topological surface states for designing chiraltronic devices with novel optoelectronic or spintronic functionalities. © 2023 authors. Published by the American Physical Society. Open access publication funded by the Max Planck Society.

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Language(s): eng - English
 Dates: 2023-05-262023-05-26
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: DOI: 10.1103/PhysRevMaterials.7.054201
 Degree: -

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Title: Physical Review Materials
  Abbreviation : Phys. Rev. Mater.
Source Genre: Journal
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Publ. Info: College Park, MD : American Physical Society
Pages: - Volume / Issue: 7 (5) Sequence Number: 054201 Start / End Page: 1 - 6 Identifier: ISSN: 2475-9953
CoNE: https://pure.mpg.de/cone/journals/resource/2475-9953